Ion Implantation
a technique where Ions are accelerated to a high Energy and speed an injected into a Semiconductor. The dominant techniques for introducing Dopants into a Semiconductor. See also Ion Implanter. | ||||
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Ion Implantation definition was found in categories: Science & Technology(2) Encyclopedia(1)
Ion Implantation Definition from Science & Technology Dictionaries & Glossaries
| AJA_Glossary of Wireless, RF and Microwave Terms |
Ion Implantation
A method of semiconductor doping in which selected dopants are ionized and accelerated at high velocity to penetrate the semiconductor substrate and become deposited below the surface. This high precision system is used to form epitaxial layers in some Avantek microwave transistors.
A method of semiconductor doping in which selected dopants are ionized and accelerated at high velocity to penetrate the semiconductor substrate and become deposited below the surface. This high precision system is used to form epitaxial layers in some Avantek microwave transistors.
| AJA_RF Technical and TestTerminology |
Ion Implantation
A method of semiconductor doping in which selected dopants are ionized and accelerated at high velocity to penetrate the semiconductor substrate and become deposited below the surface. This high precision system is used to form epitaxial layers in some Avantek microwave transistors.
A method of semiconductor doping in which selected dopants are ionized and accelerated at high velocity to penetrate the semiconductor substrate and become deposited below the surface. This high precision system is used to form epitaxial layers in some Avantek microwave transistors.
Ion Implantation Definition from Encyclopedia Dictionaries & Glossaries
| Wikipedia English - The Free Encyclopedia |
Ion implantation
Ion implantation is a materials engineering process by which ions of a material can be implanted into another solid, thereby changing the physical properties of the solid. Ion implantation is used in semiconductor device fabrication and in metal finishing, as well as various applications in materials science research. The ions introduce both a chemical change in the target, in that they can be a different element than the target, and a structural change, in that the crystal structure of the target can be damaged or even destroyed.
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